| 摘要 |
PROBLEM TO BE SOLVED: To improve uniformity of development by making the discharging loci of discharge openings differ from each other. SOLUTION: A substrate-developing apparatus which performs development on a substrate W by supplying a developing solution to the substrate W, while the apparatus rotates the substrate W is provided with a spin chuck 1 which freely rotatably supports the substrate W, a nozzle 9 having eight discharge openings 11a, from which the developing solution is discharged and which are arranged at different distances from the center of rotation P1 of the substrate W, and swinging and driving mechanism which moves the nozzle 9 in the radial direction of the substrate W. Since the discharge openings 11a are provided at different distances from a center of rotation P1 of the substrate W and the discharging loci of the discharge openings 11a are different from each other, the developing solution can be prevented from being concentrated. |
