| 摘要 |
PROBLEM TO BE SOLVED: To provide an environment control apparatus for a device manufacturing device, wherein without increasing the size of the device, good impurity removal effect is provided. SOLUTION: An environment chamber 1 for housing an exposure device body, a blowing device 3 for flow of air in the environment chamber 1, and an impurity removal filter are provided with titanium oxide (at least one from among 4, F1, and F2). When such air made to flow by a blowing device 3 passes through the impurity removal filter, impurities in the air passing through the impurity removal filter are removed through photocatalytic action of the titanium oxide. |
