发明名称 POSITIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION
摘要 <p>A photosensitive polyimide composition soluble in organic solvents, excellent in adhesiveness, heat resistance, mechanical characteristics and flexibility, and capable of exhibiting alkali-soluble, highly sensitive positive photoresist characteristics upon irradiation with light. The composition comprises a photoacid generator and a solvent soluble polyimide exhibiting positive photosensitivity in the presence of the generator.</p>
申请公布号 WO1999019771(P1) 申请公布日期 1999.04.22
申请号 JP1998004577 申请日期 1998.10.12
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