| 摘要 |
PROBLEM TO BE SOLVED: To reduce a period for forming fine element patterns, by a method wherein, via a projection optical system having a modulation step of changing space frequency and a demodulation step of reproducing mask patterns associated with this modulation amount, an optical exposure and an electron beam exposure for projecting in resist and forming patterns are used. SOLUTION: In a final titanium sapphire laser 1 and a second titanium sapphire laser 20, just after the second titanium sapphire laser 20 manufactures demodulating lattice stripes 26 by a main control system 11, the pattern exposing first titanium sapphire laser 1 is set so as to pass the lattice stripes 26. The second lattice stripes 26 are moved in a demodulating thin film 28 by changing continuously a phase of lights in a mirror 24. A first lattice 17 and the second lattice stripes 26 are synchronously scanned while patterns are exposed, so that fine patterns of 0.15μm, for example, are exposed to a resist 27, and continuously fine patterns of 0.1μm, for example, are drawn by electron beam drawing.
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