EQUIPMENT AND METHOD FOR PROCESSING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To uniform processing time toward an overall substrate when immersing the substrate in processing liquid to process the substrate. SOLUTION: A substrate W is absorbed and held inside a processing bath 10 which is formed by combining a member 11 for forming a processing bath with a plate 12 for forming a processing bath. Processing liquid is then drawn up to the processing bath 10 through a hose 15b placed beneath the processing bath 10. The liquid level of the processing liquid gradually rises therewith. After the overall substrate W is immersed in the processing bath 10, the processing bath 10 is rotated by 180 degrees by driving a motor 13. After the rotation, the processing liquid inside the processing bath 10 is then exhausted through a hose placed beneath the processing bath 10. The liquid level of the processing liquid gradually falls therewith. The substrate W is rotated by 180 degrees during the rising and the falling time of the liquid level, thus the time when the substrate contacts the processing liquid can be uniformed all over the substrate W.