| 摘要 |
<p>PROBLEM TO BE SOLVED: To uniformly process a substrate by uniformly feeding processing liquid to the overall surface of the substrate. SOLUTION: A plurality of nozzles 22a, 22b, and 22c and guide members for processing liquid 23a, 23b, and 23c opposite to each nozzle are provided inside a processing bath 21. Gutter portions 231a, 231b, and 231c are provided at each top of the guide members for processing liquid 23a, 23b, and 23c respectively, and for the processing liquid fed by each of the nozzles 22a, 22b, and 22c are uniformed in the horizontal direction (Y direction). And each lower portion of the guide members for processing liquid 23a, 23b, and 23c is provided in almost parallel to a surface of a substrate W and adjacent to the surface at regular intervals. The processing liquid fed by each nozzle is stored in the gutter portions of the guide members for processing liquid, and flows into clearances between the lower portions of the guide members for processing liquid and the substrate, W while maintaining uniformity in the horizontal direction.</p> |
