| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain an electrostatic attraction device, by which an attraction defect and a grounding defect can be detected precisely, when a sample is attracted and held by an electrostatic force. SOLUTION: In an electrostatic attraction device, a sample (a wafer) 1 is placed on a dielectric 2. When a DC voltage 4 is applied to a grounding electrode 7 at the sample 1 and an electrode 3 on the side of the dielectric 2, an electrostatic force is generated to the sample 1 and the dielectric 2, and the sample 1 is attracted onto the dielectric 2 by the electrostatic force. When the DC voltage 4 is applied, another electrode 8 which comes into contact with the sample 1 is connected to a resistance measuring circuit 9, a resistance of the electrode 8 and the electrode 7 is measured, and the grounding state of the sample 1 is judged. After that, the electrode 8 is connected to the side of a potential measuring circuit 10, and a surface potential on the sample 1 is measured when a DC voltage 13 is applied. Thereby, the grounding state of the sample 1 and the potential are checked.</p> |
