发明名称 |
Apparatus and method for the in-situ generation of dopants |
摘要 |
A method and apparatus for generating a dopant gas species which is a reaction product of a metal and a gas reactive therewith to form the dopant gas species. A source mass of metal is provided and contacted with the reactive gas to yield a dopant gas species. The dopant gas species may be passed to a chemical vapor deposition reactor, or flowed to an ionization chamber to generate ionic species for ion implantation. |
申请公布号 |
AU8771698(A) |
申请公布日期 |
1999.03.01 |
申请号 |
AU19980087716 |
申请日期 |
1998.08.05 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
GAUTAM BHANDARI;W. KARL OLANDER;MICHAEL A. TODD;TIMOTHY E. GLASSMAN |
分类号 |
H01J27/02;C23C16/448;C30B25/14;C30B31/16;H01L21/205;H01L21/265;H01L21/383 |
主分类号 |
H01J27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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