| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of registration consisting of performing registration among specified number of shot on a wafer by statistical processing of the position of the shot regions by which the number of marks for measurement can be reduced, without degrading the accuracy of measurement and the processing time can be reduced at the same time. SOLUTION: Two preliminary sample shots A1 and A2 are selected from among all the shot regions on a wafer W. Additionally, eight sample shots B1-B8 are selected. According to the result of the measurement of the position of the preliminary sample shot A1 (its wafer mark), the offset is corrected, and the position of the preliminary sample shot A1 is remeasured. According to the result of the measurement of the position of the preliminary sample shot A2, the rotation angle is corrected and the position of the preliminary sample shot A2 is remeasured. Based on the result of the measurement of the rest of the sample shots B1-B8 and the result of the second measurement of the preliminary sample shots A1 and A2, alignment is performed by an EGA method. |
