发明名称 |
RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH |
摘要 |
A resist resin containing a copolymer having a (meth)acrylic structure having a side chain group decomposable with an acid and a polyorganosilsequioxane structure of general formula (1) in the same molecule, or a mixture of polymers having these structures in different molecules, and a process for patterning with the resist resin wherein the symbols are as defined in the description. This resist resin has a high sensitivity to a radiation having a short wavelength of 220 nm or below and is capable of forming a fine parttern of the order of 0.15 mu m or below.
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申请公布号 |
WO9909457(A1) |
申请公布日期 |
1999.02.25 |
申请号 |
WO1998JP03589 |
申请日期 |
1998.08.12 |
申请人 |
SHOWA DENKO K.K.;NAMBA, YOICHI;TAKAHASHI, HIROSHI |
发明人 |
NAMBA, YOICHI;TAKAHASHI, HIROSHI |
分类号 |
C08G77/442;C08L83/04;C08L83/10;G03F7/039;G03F7/075;(IPC1-7):G03F7/075;C08L33/04 |
主分类号 |
C08G77/442 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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