Dual-sided expose mechanism for web product

摘要

An apparatus and method of using same for exposing successive sections of opposite sides of a web of material to actinic radiation in patterns on each section of the opposite sides of the web is provided. The apparatus includes a first station having mechanisms to locate and expose selected sections on the first side of the web to actinic radiation in a first pattern, and a second station spaced from the first station having mechanisms to locate and expose selected sections on the second side of said web to actinic radiation. The first and second stations include first and second pattern masters and first and second mountings for the masters, and first and second sources of actinic radiation to project the desired patterns of exposure from each of the masters to each of the sections on the first and second sides of the web in very close registration or alignment thereof. Each of the stations includes a web locating device to locate the web and the master with respect to each other at each station, and each of said stations includes a mechanism to selectively maintain the master and web in a located position contacting each other during exposure, and a web transfer mechanism to periodically transport the sections to and from the stations. The invention also includes a program which uses fiducial marks on the masters and alignment devices on the web to provide a best fit of the master with the web at each location.