摘要 |
There is described a precursor for preparing a resist pattern, said precursor comprising an imageable layer which includes a relatively volatile compound that can be volatilised by application of heat, wherein imaging radiation can be applied to the precursor to heat areas thereof and volatilise said compound so that properties, for example, the ink accepting abilities of heated and non heated areas, are different. |
申请人 |
HORSELL GRAPHIC INDUSTRIES LIMITED;RAY, KEVIN, BARRY;SPOWAGE, MARK, JOHN |
发明人 |
RAY, KEVIN, BARRY;SPOWAGE, MARK, JOHN |