Chromium oxynitride sputter deposition from pure chromium target

摘要

In the sputter deposition of chromium oxynitride coatings using a pure chromium target in a vessel (1) supplied with argon, oxygen and nitrogen, the vessel (1) is also supplied with a gaseous hydrocarbon, preferably methane. Preferably, the gaseous hydrocarbon and argon are supplied within a target screen (7) and argon, oxygen and nitrogen are supplied outside the screen (7).