Substrate spin cleaning apparatus

摘要

A substrate supporting device has a turntable mounted on a rotary shaft for supporting a substrate and spinning the substrate about a vertical axis. The turntable is replaceable by a load measuring device including a load meter mounted on a support bracket having a tube attachable to the rotary shaft. The load meter receives a cleaning brush to measure a pressing load applied therefrom. The load meter has a pressure sensor with an upper surface thereof at an equal level to the surface of the substrate to be placed on the substrate supporting device. Thus, a pressure to be applied to the substrate is measured in the same position as where the substrate is actually treated.