发明名称 MASK PROTECTIVE DEVICE
摘要 <p>An opening end face of a frame is closed by a transparent thin film, a vent is formed in the frame, and a filter having a filtration area larger than the sectional area of the vent is mounted to the frame to cover the vent. The filtration area of the filter an effective area where allows the passage of gas in the filter. Then, the filter is mounted to the frame so that there is a certain space between the frame and the filter. In the convent,ional device, since the filter is directly mounted to the frame without space between the filter and the frame, the filtration area of the filter is substantially the same as the sectional area of the vent. In case of mounting the filter apart from the frame, however, the filtration area of the filter can be lager than the sectional area of the vent so that the quantity of gas flow is greater than that of the conventional one. Therefore, its adaptability to the changes in atmospheric pressure and in temperature is also improved. &lt;MATH&gt;</p>
申请公布号 KR0164946(B1) 申请公布日期 1999.01.15
申请号 KR19950024036 申请日期 1995.08.04
申请人 MITSUI CHEMICALS INC. 发明人 FUJITA, MINORU;BAKAGAWA, HIROAKI
分类号 G03F1/64;H01L21/027;(IPC1-7):G03F1/00;G03F9/00 主分类号 G03F1/64
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