发明名称 |
Liquid photoimageable resist |
摘要 |
<p>A liquid applied photoresist composition is disclosed which exhibits a favorable balance of photospeed and overall physical properties. The photoresist composition includes a binder, a multifunctional monomer, a photoinitiator, and a solvent. The photoinitiator is present in the photoresist in an amount of greater than about 10% by weight of the photoresist without solvent. The photoresist when applied is relatively resistant to blocking when applied to a substrate. A process for producing a negative resist image on a surface using the photoresist is also disclosed.</p> |
申请公布号 |
EP0706091(B1) |
申请公布日期 |
1998.12.30 |
申请号 |
EP19950115322 |
申请日期 |
1995.09.28 |
申请人 |
MACDERMID IMAGING TECHNOLOGY INC. |
发明人 |
LOO, DEKAI;MAYES, RICHARD T. |
分类号 |
G03F7/028;G03F7/031;H05K3/00;H05K3/06;(IPC1-7):G03F7/031 |
主分类号 |
G03F7/028 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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