发明名称 Method for fabricating thin films of barium strontium titanate without exposure to oxygen at high temperatures
摘要 A liquid precursor containing barium, strontium, and titanium, is applied to a first electrode, dried in air at a first temperature of 160 DEG C. and then a second temperature of 400 DEG C., and annealed at a temperature of 800 DEG C. in nitrogen to form a thin film of barium strontium titanate. A second electrode is deposited and then the device is patterned to form a capacitor, and a second anneal is performed at a temperature of 800 DEG C. in nitrogen. In this manner, a high electronic quality thin film of barium strontium titanate is fabricated without a high-temperature oxygen anneal.
申请公布号 US5853500(A) 申请公布日期 1998.12.29
申请号 US19970896574 申请日期 1997.07.18
申请人 SYMETRIX CORPORATION 发明人 JOSHI, VIKRAM;PAZ DE ARAUJO, CARLOS A.
分类号 C23C18/12;H01L21/314;H01L21/316;H01L21/8242;H01L27/108;(IPC1-7):B05D5/12 主分类号 C23C18/12
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