发明名称 METHOD AND APPARATUS FOR VAPOR GENERATION AND FILM DEPOSITION
摘要 <p>A vapor generator (19, 62) and connected chemical vapor deposition chamber (28) for providing a vapor for operation such as chemical vapor deposition has an atomizer (16, 16A, 38, 50) for forming an aerosol or droplet spray (36, 58, 74, 80) separate from a vaporization chamber (19, 62). The aerosol is passed into a heated vaporization chamber (19, 62) wherein the particles or droplets are flash vaporized and larger droplets are vaporized by direct contact with heated surfaces. The resulting gas/vapor stream is then used for chemical vapor deposition, in a separate chemical vapor deposition chamber (26). The vapor and gas stream is preferably passed through a restricted passageway (22, 44, 68) for mixing before being introduced into the chemical vapor deposition chamber (26).</p>
申请公布号 WO1998055668(A1) 申请公布日期 1998.12.10
申请号 US1998011090 申请日期 1998.06.01
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