| 摘要 |
PROBLEM TO BE SOLVED: To stabilize groove shapes, to simplify production processes and to improve workability by forming a photoresist layer on a ground surface layer consisting of a cellulose deriv. having a hydroxyalkoxy group and shutting off development at the boundary between the ground surface layer and the photoresist layer. SOLUTION: The ground surface layer formed by adding a crosslinking material consisting of a methylol melamine resin to an aq. PVA soln. is formed on a glass substrate subjected to a silane coupling treatment and the photoresist layer of 500Åis formed thereon. The photoresist is exposed by a gaseous laser and is developed for 60 seconds with a developer of 33% sodium metasilicate NaOSiO2 /XH2 O, by which the groove shapes of the fine patterns are obtd. A conductive film is imparted to the surface and after Ni is electroformed, the glass substrate is peeled to obtain a stamper. The concn. of the crosslinking material consisting of the methylol melamine resin is set at a range of 8 to 18 wt.% and the film thickness of the ground surface layer is set at a range of 30 to 70Å.
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