Continuous jetting of liquid metal droplets for deposit on a substrate includes an ejector, a deflection device, a print chute, and a collection reservoir. Liquid metal from a cartridge in the ejector provides a continuous molten material stream through an orifice-defining structure while a vibration device creates a standing wave in the stream to break the molten material stream into individual droplets which receive charge from a charging device. The deflection device enables the positioning of the charged droplets to be controlled for placement on a substrate. Control systems assist in the calibration and control of the continuous stream to ensure that selected droplets are placed at desired locations on the substrate.
申请公布号
WO9836864(A3)
申请公布日期
1998.12.03
申请号
WO1998US02519
申请日期
1998.02.09
申请人
MPM CORPORATION
发明人
PHAM-VAN-DEIP, GERALD;MUNTZ, E., PHILIP;WATTS, HAL;JOHNSON, WILLIAM;MAIN, MELVIN;SMITH, ROBERT, F., JR.;ORME-MARMARELIS, MELISSA, E.