| 摘要 |
<p>Lithography system comprising a light source producing a light beam directed to a mask (3) located in a mask level and an optical demagnifier (4-6) for demagnifying by a factor and focusing the beam. The light beam is focused on a converter element (8) for converting said beam in a further beam having a smaller wavelength than UV light. The beam at the mask level has a transversal size smaller than the desired resolution at the object level multiplied by the demagnifying factor. <IMAGE></p> |
