发明名称 |
Precursor for semiconductor thin films and method for producing semiconductor thin films |
摘要 |
<p>A precursor for manufacturing a semiconductor thin film in which an oxide thin film comprising at least one element as a dopant selected from an element group which consists of Ia-, IIa-, IIb-, Va- and Vb-group element, and Ib- and IIIa-group elements which are main components are deposited on a substrate, or a precursor for manufacturing a semiconductor thin film which is formed by depositing the oxide thin film comprising the Ib- and IIIa-group elements on the substrate wherein at least one of compositions of the Ib- and IIIa-group elements is varied in the direction of a film thickness, and a method for manufacturing a semiconductor thin film comprising the step of heat treating the precursor for manufacturing the semiconductor thin film in the atmosphere containing the VIa-group element. The present invention provides a precursor for manufacturing a semiconductor thin film and a method for manufacturing the semiconductor thin film using the precursor which are suitable for manufacturing the semiconductor thin film having a chalcopyrite structure that has a high energy and uniform efficiency in the case where the semiconductor thin film is used as a photoabsorptive layer of a solar cell. <IMAGE></p> |
申请公布号 |
EP0743686(A3) |
申请公布日期 |
1998.12.02 |
申请号 |
EP19960107692 |
申请日期 |
1996.05.14 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD |
发明人 |
NEGAMI, TAKAYUKI;TERAUCHI, MASAHARU;NISHITANI, MIKIHIKO;WADA, TAKAHIRO |
分类号 |
C23C14/06;C23C14/08;C23C14/58;H01L31/032;H01L31/0336;(IPC1-7):H01L31/032;H01L31/18 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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