发明名称 Precursor for semiconductor thin films and method for producing semiconductor thin films
摘要 <p>A precursor for manufacturing a semiconductor thin film in which an oxide thin film comprising at least one element as a dopant selected from an element group which consists of Ia-, IIa-, IIb-, Va- and Vb-group element, and Ib- and IIIa-group elements which are main components are deposited on a substrate, or a precursor for manufacturing a semiconductor thin film which is formed by depositing the oxide thin film comprising the Ib- and IIIa-group elements on the substrate wherein at least one of compositions of the Ib- and IIIa-group elements is varied in the direction of a film thickness, and a method for manufacturing a semiconductor thin film comprising the step of heat treating the precursor for manufacturing the semiconductor thin film in the atmosphere containing the VIa-group element. The present invention provides a precursor for manufacturing a semiconductor thin film and a method for manufacturing the semiconductor thin film using the precursor which are suitable for manufacturing the semiconductor thin film having a chalcopyrite structure that has a high energy and uniform efficiency in the case where the semiconductor thin film is used as a photoabsorptive layer of a solar cell. <IMAGE></p>
申请公布号 EP0743686(A3) 申请公布日期 1998.12.02
申请号 EP19960107692 申请日期 1996.05.14
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD 发明人 NEGAMI, TAKAYUKI;TERAUCHI, MASAHARU;NISHITANI, MIKIHIKO;WADA, TAKAHIRO
分类号 C23C14/06;C23C14/08;C23C14/58;H01L31/032;H01L31/0336;(IPC1-7):H01L31/032;H01L31/18 主分类号 C23C14/06
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