| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition capable of developing with an alkaline solution, high in sensitivity and capable of increasing film thickness. SOLUTION: This positive photosensitive resin composition contains a material generating an acid by light and a polymer in which the concentration of carboxy groups is <=2.6 mmol/g and having sulfo groups represented by the formula in which each of R<1> , R<2> , R<3> is a 6-50C alkyl, aryl, aralkyl or heterocyclic group optionally in which an O or S atom, methylene, amine, carbonyl, sulfon, ester, sulfon ester, amido, urea, carbonate or carbamate, a polyvalent bonding group can be contained except an imido or a sidechain alkoxycarbonyl group respectively, at least one of them has a sulfo group and (x) representing a structural ratio of repeating units is 5-100 mol.%. |
