发明名称 BLACK RESIST COMPOSITION FOR FORMING BLACK MATRIX AND COLOR FILTER
摘要 <p>PROBLEM TO BE SOLVED: To provide a black resist composition for color filter having excellent developing property, resolution, adhesive property, stability and a large developing latitude by specifying the glossiness of a prescribed mirror surface of a resin black matrix. SOLUTION: The glossiness of 20 deg. mirror surface of a resin black matrix provided on the transparent substrate of a color filter is set within the range of 100-200. The resin black matrix is a light shielding film formed from the black resist having main components of resin and black pigment and the resin and the black pigment are not specially limited. The mirror surface glossiness is a method representing the glossiness by reflection intensity in the direction of normal reflection, 20 deg., 45 deg., 60 deg., 75 deg., 85 deg.-mirror surface glossinesses are known depending upon a measuring sample, since the measured sample is the resin black matrix in this case, 20 deg. mirror surface glossiness is applied and it is necessary that the 20 deg. mirror surface glossiness falls within the range of 100-200.</p>
申请公布号 JPH10300923(A) 申请公布日期 1998.11.13
申请号 JP19970322843 申请日期 1997.11.25
申请人 MITSUBISHI CHEM CORP 发明人 TAKASAKI RYUICHIRO;MATSUO FUMIYUKI;IKEDA SHINGO
分类号 G03F7/004;C09D5/00;G02B5/00;G02B5/20;G03F7/027;(IPC1-7):G02B5/20 主分类号 G03F7/004
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