发明名称 REFLECTION TYPE TWO-DIMENSIONAL MATRIX SPACE LIGHT MODULATION ELEMENT
摘要 PROBLEM TO BE SOLVED: To reduce an effect due to leakage light to a semiconductor constituting a pixel circuit by light-shielding incident light in a pixel gap, to effectively use output light in a pixel electrode gap and to improve picture quality by the output light in a reflection type two-dimensional matrix space light modulation element. SOLUTION: This space light modulation element is constituted of being provided with plural pixel electrodes 25 consisting of rows and columns and arranged in a two-dimensional matrix shape, a counter electrode 28 arranged at a gap between with these pixel electrodes 25 and a light modulation layer 30 consisting of a liquid crystal, etc., arranged between the counter electrode 28 and the pixel electrodes 25. In such a case, an insulation film 40 is formed between the pixel electrodes 25 and the light modulation layer 30, and a conductive film (pixel gap electrode) 41 covering at least a part of the gap between the pixel electrodes 25 each other is formed through the insulation film 40.
申请公布号 JPH10288775(A) 申请公布日期 1998.10.27
申请号 JP19970098949 申请日期 1997.04.16
申请人 FUJI PHOTO FILM CO LTD 发明人 KIMURA KOICHI
分类号 G02F1/1333;G02F1/133;G02F1/1335;G02F1/1343;G02F1/136;G02F1/1362;G02F1/1368 主分类号 G02F1/1333
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