发明名称 Cleaning method and cleaning apparatus
摘要 A part subjected to cleaning is cleaned or rinsed with a cleaning agent or rinsing agent having a nonaqueous type solvent or a hydrophilic solvent as a main component thereof. Then the cleaning agent or rinsing agent adhering to the cleaned or rinsed part subjected to cleaning is removed with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The part is subsequently dried. Otherwise, after the part subjected to cleaning has been cleaned with an aqueous type solvent or wash with water, the part is cleaned and dried with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent can be used for cleaning or rinsing the part subjected to cleaning.
申请公布号 US5823210(A) 申请公布日期 1998.10.20
申请号 US19950454729 申请日期 1995.05.31
申请人 TOSHIBA SILICONE CO., LTD. 发明人 INADA, MINORU;IMAJO, YASUTAKA;UCHINO, MASAHIDE
分类号 B08B3/04;B08B3/08;C11D7/24;C11D7/26;C11D7/28;C11D7/50;C11D11/00;C23G5/02;C23G5/028;C23G5/032;C23G5/04;H05K3/26;(IPC1-7):B08B3/10 主分类号 B08B3/04
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