| 摘要 |
PROBLEM TO BE SOLVED: To provide the subject producing method for almost completely removing residual abrasive materials such as cerium oxide and foreign matter in water, conventionally appeared on a mirror-polished glass surface by precision cleaning of the mirror- polished glass surface by using an extrapure water which is produced in such a manner that a first-order pure water with a resistivity is activated through electromagnetic wave for removing the impurities therefrom. SOLUTION: This method comprises: mirror-polishing a glass surface, to which foulings such as flaws and films caused by chemicals lie adhered, by using an abrasive such as cerium oxide in an abrasive apparatus; removing foulings of relatively large- sized abrasive adhered to the mirror-polished glass surface by scrub cleaning using ultrapure water obtained by activating first-order pure water with a resistivity of 2 to 3 MΩ.cm through electromagnetic wave followed by removing the foreign matter therein; removing foulings such as relatively smaller ones remained unremoved through the above scrub cleaning and organic ones e.g. fingerprints, by a surface-active agent or ultrasonic cleaning using ultrapure water, followed by rotating the glass in high speed so as to dry the glass surface; and coating the surface with an adhesive material and subsequently with a resist of photosensitive agent.
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