| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treating apparatus with a good workability during maintenance and with a high degree of freedom for the arrangement of treatment units. SOLUTION: A unit arrangement part 10 comprises at the lowermost part thereof a chemical cabinet 11, and on the upper side thereof and at the four corners of the apparatus there are arranged coating treatment units SC1, SC2 for forming a resist film on the substrate and developing treatment units SD1, SD2 for carrying out the developing treatment for the substrate after exposure, as liquid treatment units. Further, on the upper side of these liquid treatment units there are arranged multi-stage heat treatment units 20 in the front and rear parts of the apparatus. Further, a cleaning treatment unit SS for supplying a cleaning solution such as pure water, etc., to the substrate for cleaning the substrate is disposed on the front side of the apparatus and between the coating treatment units SC1, SC2. |
