MANUFACTURE OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an active matrix liquid crystal display device having highly fine display performance. SOLUTION: An interlayer insulating film 104 covering TFTs 102, 103 formed on a substrate 101 is flattened with mechanical polishing represented by CMP (chemical mechanical polishing). Out the polished interlayer insulating film pixel electrodes 106, 107 are formed and further an insulating film, 108 covering the pixel electrode is formed. The insulating film 108 is flattened by performing mechanical polishing again to cause the surface of the pixel electrode and the surface of insulators 112, 113 to be flush with each other. Hereby, there is eliminated any step on the pixel electrode surface to prevent a liquid crystal material from failure in alignment and contrast from being lowered due to random reflection of light, etc.