| 摘要 |
In a memory cell region, there are formed a pair of driver transistors and a pair of access transistors. On an insulating layer covering these transistors, there are formed a pair of high resistances. To cover the high resistances, there is formed an insulating layer. On the insulating layer, there is formed a word line. To cover the word line, there is formed an insulating layer and, on the insulating layer, there are formed a GND wiring and bit lines. Thereby, a semiconductor memory device capable of stabilized operation even when a lowered power source voltage is used can be obtained.
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