发明名称 REMOVAL METHOD AND DEVICE FOR MICRO PROJECTION
摘要 <p>PROBLEM TO BE SOLVED: To allow a sufficiently accurate machining process for a micro projection formed due to foreign matter and caused to adhere to the surface of a color filter as a primary factor for a pixel defect. SOLUTION: Before a machining process, a polishing head 4 is kept in contact with a normal region (n) in the vicinity of a micro projection, and the reference height of the head 4 is saved. Thereafter, the machining process is started and ended when the progress of the process reaches the reference height. Also, a measurement device capable of taking measurements by the unit of a 0.01μm is used to measure the height of a machining means, and pressing force at the machining process is set within the range where the deformation amount of the micro projection does not exceed 0.15μm at least during a final machining stage.</p>
申请公布号 JPH10253818(A) 申请公布日期 1998.09.25
申请号 JP19970059098 申请日期 1997.03.13
申请人 SHARP CORP 发明人 ASAI SHIGEMI
分类号 G02B5/20;B24B49/04;B24B49/12;B24B49/16;(IPC1-7):G02B5/20 主分类号 G02B5/20
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