发明名称 |
MANUFACTURE OF THIN-FILM TRANSISTOR ARRAY, ELECTRONIC DEVICE AND THIN-FILM TRANSISTOR |
摘要 |
<p>PROBLEM TO BE SOLVED: To form a thin-film transistor array in a self-alignment way on a substrate such as plastic substrate which greatly deforms. SOLUTION: Exposure from back is carried to with gate lines 11 as a mask. A plating layer 16 is formed by a metal exhibiting a higher etching rate than that of a metallic layer 17 forming signal lines 21, a source electrode and a drain electrode above a channel of a semiconductor film 13 with a resist pattern aligned with the gate lines. A thin-film transistor array in which a gate, a source and a drain are formed in a self-alignment way can be obtained by etching the plating layer 16 and the metallic layer 17 at the same time.</p> |
申请公布号 |
JPH10256558(A) |
申请公布日期 |
1998.09.25 |
申请号 |
JP19970062621 |
申请日期 |
1997.03.17 |
申请人 |
TOSHIBA CORP |
发明人 |
IKEDA MITSUSHI;HARA YUJIRO;ASHIDA SUMIO |
分类号 |
G02F1/136;G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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