| 摘要 |
A short wavelength reduction projection optical system used for transferring integrated circuit patterns from a reticle to a wafer in a semiconductor manufacturing system. The optical system has object side and image side virtually telecentric, high resolution over a wide exposure area, and adequately compensates for optical aberrations without increasing the length of the optical system. The optical system has a first group of lenses with weak refractive power, a second group of lenses with a positive refractive power, a third group of lenses with a negative refractive power, a fourth group of lenses with a positive refractive power, and an aperture stop located between the third and fourth groups of lenses.
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