LOW PRESSURE CHEMICAL VAPOR DEPOSITION EQUIPMENT,申请号JP19970058523-传众专利搜索

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发明名称	LOW PRESSURE CHEMICAL VAPOR DEPOSITION EQUIPMENT
摘要
申请公布号	JPH10242063(A)	申请公布日期	1998.09.11
申请号	JP19970058523	申请日期	1997.02.25
申请人	TOKIN CORP	发明人	NEMOTO MICHIO
分类号	C23C16/44;C23C16/455;H01L21/205;(IPC1-7):H01L21/205	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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