PLASMA SOURCE FOR HDP-CVD CHAMBER

摘要

PROBLEM TO BE SOLVED: To provide a new antenna coil for a substrate treatment plasma system. SOLUTION: A plasma system has a chamber mainbody 12 formed with a plasma treatment cavity 16 inside and a gas guide port 300 at the center and a top antenna coil 40 properly formed corresponding to the plasma treatment cavity to form a plasma density profile, a dense at the center, above a substrate during operation. The top antenna coil 40 has a center passage 308 to encircle a center gas guide port. To develop the plasma density profile, thin at the center, above the substrate during operation, a side antenna coil 42 is desirably formed and arranged corresponding to a plasma chamber. The top antenna coil 40 and the side antenna coil 42 cooperate each other to form uniform plasma all over the surface of the substrate to be treated.