| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a member having superior plasma resistance in an atmosphere of halogen-contg. corrosive gas by forming the surface of a member exposed to plasma in the atmosphere with a Y-Al-garnet sintered compact having specified porosity and specifying the surface roughness. SOLUTION: The surface of a member exposed to plasma in an atmosphere of halogen-contg. corrosive gas such as F- or Cl-contg. gas is formed with a Y-Al-garnet sintered compact having <=3% porosity and the center line average surface roughness Ra is regulated to <=1μm. Plasma resistance to the halogen- contg. corrosive gas can further be improved by reducing the total amt. of oxides of group IIa elements of the Periodic Table and SiO2 contained in the sintered compact to <=1,500ppm. The resultant plasma resistant member is useful to produce constituent parts of a semiconductor producing device having a long service life.</p> |
