发明名称 |
Test pattern group and a method of measuring an insulation film thickness utilizing the same |
摘要 |
The present invention relates to a test pattern group and a method for measuring an insulation film thickness utilizing the same, and to the test pattern group comprising at least 3 (three) test patterns having a construction of a capacitor and a method for more precisely measuring the insulation film thickness utilizing the test pattern group, in a method for electrically measuring a capacitance of the insulation film applied to a semiconductor device and converting the measured capacitance to a thickness of the insulating film.
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申请公布号 |
US5801538(A) |
申请公布日期 |
1998.09.01 |
申请号 |
US19960702835 |
申请日期 |
1996.08.22 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
KWON, OH JUNG |
分类号 |
H01L21/66;H01L23/544;(IPC1-7):G01R27/26 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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