发明名称 Test pattern group and a method of measuring an insulation film thickness utilizing the same
摘要 The present invention relates to a test pattern group and a method for measuring an insulation film thickness utilizing the same, and to the test pattern group comprising at least 3 (three) test patterns having a construction of a capacitor and a method for more precisely measuring the insulation film thickness utilizing the test pattern group, in a method for electrically measuring a capacitance of the insulation film applied to a semiconductor device and converting the measured capacitance to a thickness of the insulating film.
申请公布号 US5801538(A) 申请公布日期 1998.09.01
申请号 US19960702835 申请日期 1996.08.22
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. 发明人 KWON, OH JUNG
分类号 H01L21/66;H01L23/544;(IPC1-7):G01R27/26 主分类号 H01L21/66
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