| 发明名称 |
THE MANUFACTURING METHOD OF HALF-TONE PHASE SHIFT MASK |
| 摘要 |
A deep ultra-violet (DUV) half tone phase shifting mask is made by depositing a Cr thin film containing fluorine preferably in a ratio of Cr:F of about 1:2 on a transparent support in which the transparency is 4 to 10% for DUV light and the thickness is 1000 to 1500 Ñ. |
| 申请公布号 |
KR0147493(B1) |
申请公布日期 |
1998.08.01 |
| 申请号 |
KR19950037190 |
申请日期 |
1995.10.25 |
| 申请人 |
HYUNDAI ELECTRONICS IND. CO.,LTD |
发明人 |
MOON, SEUNG-CHAN;JUNG, WOO-YOUNG |
| 分类号 |
G03F1/32;G03F1/68;H01L21/027 |
主分类号 |
G03F1/32 |
| 代理机构 |
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