发明名称 SUPPORT DEVICE OF WAFER, AND TRANSFER DEVICE PROVIDED WITH THE SAME
摘要 PROBLEM TO BE SOLVED: To reduce the generation of foreign matter, and increase the washing efficiency, by grasping a wafer by the co-operation of at least one support member and at least two fixing members, and reducing a size of a supporting part. SOLUTION: A support base 30 comprises a number of grooves 32 for locating and supporting a wafer on a support member 31, and for example the rod-shaped first connecting member 33 is mounted on one side of the support member 31. A fixing rod 40 comprises a number of grooves 42 for locating and supporting the wafer to a fixing member 41, the intervals thereof are agreed with those of the grooves 32 formed on the support member 31, and the second connecting member 43 is mounted on one end of the fixing member 41. The position of the fixing rod 40 is also moved by the second connecting member 43. The first connecting member 33 and the second connecting member 43 are connected to an actuator of an automatic controller including an robot arm, to be accurately controlled by a controlling device.
申请公布号 JPH10194453(A) 申请公布日期 1998.07.28
申请号 JP19970348771 申请日期 1997.12.18
申请人 LG SEMICON CO LTD 发明人 HAN SUK-BIN
分类号 B65G49/07;H01L21/304;H01L21/673;H01L21/677;H01L21/68;H01L21/687;(IPC1-7):B65G49/07 主分类号 B65G49/07
代理机构 代理人
主权项
地址
您可能感兴趣的专利