发明名称 Multi-beam pitch adjustment system and method
摘要 The current disclosure discloses methods of and systems for automatically adjusting or selecting a pitch between beams in a multi-beam scanning system. An array of light sources is mounted on a rotatable housing and emits light in a direction perpendicular to the rotational plane. The system or method measures a pitch on or near an intermediate image-forming surface. In response to the measured pitch, the scanning as well as sub-scanning pitch is automatically adjusted or selected by rotating a housing unit to maintain a desired pitch.
申请公布号 US5786594(A) 申请公布日期 1998.07.28
申请号 US19970786203 申请日期 1997.01.21
申请人 RICOH COMPANY, LTD. 发明人 ITO, TATSUYA;NAKAJIMA, TOMOHIRO;YAMAGUCHI, KATSUMI;SHIMURA, AKIRA;NARITA, MASAKI;YAMAZAKI, SHUICHI;ITO, SATORU
分类号 B41J2/47;G02B26/12;H04N1/113;H04N1/12;H04N1/191;(IPC1-7):H04N1/36 主分类号 B41J2/47
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