发明名称 THIN FILM FORMING MATERIAL AND FORMING METHOD FOR THIN FILM
摘要 PROBLEM TO BE SOLVED: To form a homogeneous thin film for effectively and stably realizing desired characteristics on a base material in simple steps by holding thin film forming substance on a porous material made of normal temperature curable substance. SOLUTION: After water is added to gypsum and agitated, it is cast in a plastic casting mold 1 and dried at ambient temperature. The gypsum 2 in the mold 1 is impregnated with water-repellent treating solution containing perfluoroalkyl group-containing compound. Further, the gypsum 2 is dried, for example, at 70 deg.C, then removed from the mold 1, and installed in a vacuum tank 4 of a vacuum deposition unit. Then, a synthetic resin lens 7 to become base material to be deposited is set in the tank 4. An electron beam 11 is emitted to a sample by an electron beam depositing method by using an electron gun 8 and ZrO2 , 9, SiO2 10 provided oppositely, an SiO2 thin film and ZrO2 thin film are alternately laminated to obtain a lens with an antireflection film.
申请公布号 JPH10193489(A) 申请公布日期 1998.07.28
申请号 JP19970298807 申请日期 1997.10.30
申请人 CANON INC;OPUTORON:KK 发明人 MIYAZAWA YOSHIKAZU;AOKI TOMONORI
分类号 G02B1/10;B32B5/18;B32B27/00;B32B27/30;C23C14/08;G09F9/30 主分类号 G02B1/10
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