发明名称 PROCESSING LIQUID SUPPLY MECHANISM
摘要 PROBLEM TO BE SOLVED: To supply a processing liquid to each processor from a single processing liquid supply mechanism even when a plurality of processors are provided by controlling a valve unit such that the time for delivering the processing liquid is not overlapped among the processors. SOLUTION: When a valve 160 is opened by a control signal from a controller 138, a developer in a tank 170 is passed through a flow rate regulator 168, a filter 166 and a heat-exchanger 164 associated with a transfer tube 162 and conditioned to a desired state. It is then supplied through a branch pipe and the valve 160 to a developer delivery nozzle N1 which also delivers the developer onto a wafer. In the development processor, the valve 160 is closed by a control signal from the controller 138 after a specified quantity of developer is applied onto the wafer and rotation of a spin chuck 134 is stopped.
申请公布号 JPH10189432(A) 申请公布日期 1998.07.21
申请号 JP19960355723 申请日期 1996.12.24
申请人 TOKYO ELECTRON LTD 发明人 KIMURA YOSHIO;MORITA SATOSHI;MATSUYAMA YUJI
分类号 G03F7/30;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/30
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