| 摘要 |
<p>PROBLEM TO BE SOLVED: To lessen the damage of light shielding film patterns by washing and to prevent the occurrence of mask defects by embedding the light shielding film patterns in the transparent substrate of a mask and flattening the mask surface. SOLUTION: A part of the transparent substrate 1 is selectively etched to form grooves 4. A light shielding film 5 is deposited over the entire surface of the transparent substrate formed with these grooves 4. The light shielding film 5 is polished until the surface of the light shielding film is flattened. The light shielding film is etched back until the transparent substrate surface is exposed to allow the light shielding film 5 to remain only within the grooves 4. As a result, the photomask surface may be flattened. The remaining of the foreign matter in the pattern edge parts of the light shielding film 5 is eliminated, the occurrence rate of the defect is lowered and the improvement in the capability to remove the foreign matter is simplified. The transmittance of the light shielding film 5 is made uniform by using a CMP and phase differences are made uniform as well in the case of a halftone mask.</p> |
