PATTERN AND METHOD FOR MEASURING EXPOSURE ACCURACY,申请号JP19960339198-传众专利搜索

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发明名称	PATTERN AND METHOD FOR MEASURING EXPOSURE ACCURACY
摘要
申请公布号	JPH10177946(A)	申请公布日期	1998.06.30
申请号	JP19960339198	申请日期	1996.12.19
申请人	SONY CORP	发明人	KASUGA TAKU
分类号	G01B11/00;G01B15/00;G01B21/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027	主分类号	G01B11/00
代理机构		代理人
主权项
地址

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