发明名称 METHOD OF POST-ETCHING A MECHANICALLY TREATED SUBSTRATE
摘要 Method of providing a pattern of apertures and/or cavities in, for example, a glass duct plate of a plasma-addressed liquid crystal display, in which first a mechanical treatment is performed (for example, by means of powder blasting) and then a wet-chemical etching treatment is performed to render the walls of the ducts microscopically less rough so that the optical disturbance is reduced and the glass becomes clearer again.
申请公布号 WO9827020(A1) 申请公布日期 1998.06.25
申请号 WO1997IB01530 申请日期 1997.12.04
申请人 PHILIPS ELECTRONICS N.V.;PHILIPS NORDEN AB 发明人 SPIERINGS, GIJSBERTUS, ADRIANUS, CORNELUS, MARIA;LARSEN, POUL, KJERPY;VAN DER PUTTEN, JAN, BAPTIST, PETRUS, HENRIKUS;BUSIO, JOHANNES, MARIA, MARCUS;IN'T VELD, FREDERIK, HENDRIK;POSTMA, LAMBERTUS
分类号 C03C15/00;C03C19/00;C23F1/02;G02F1/13;G02F1/1333;(IPC1-7):C03C15/00 主分类号 C03C15/00
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