Copolymeren die N-vinyllactamderivaten bevatten, methoden ter bereiding daarvan en daarvan gemaakte fotoresistmaterialen.

摘要

Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist.