发明名称 |
Metal rinsing process with controlled metal microcorrosion reduction |
摘要 |
<p>Process for rinsing a metallized substrate subject to metal microcorrosion using an acidic aqueous rinsing solution characterized in that the rinsing solution comprises at least one strong inorganic acid in an amount enough to reduce the alkalinity of the rinse solution to a level low enough to reduce microcorrosion of the said metal layer while rinsing.</p> |
申请公布号 |
EP0846985(A1) |
申请公布日期 |
1998.06.10 |
申请号 |
EP19960870157 |
申请日期 |
1996.12.09 |
申请人 |
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW |
发明人 |
ROTONDARO, ANTONIO;VOS, RITA;HEYNS, MARK |
分类号 |
G03F7/42;H01L21/02;H01L21/311;H01L21/3213;(IPC1-7):G03F7/42 |
主分类号 |
G03F7/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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