| 摘要 |
PROBLEM TO BE SOLVED: To work the fine pattern on a substrate to be worked as a mask material with excellent yield by successively laminating a support body, a prescribed first photosensitive resin layer, and a prescribed photosensitive resin layer in a photosensitive resin laminated body for sand blast. SOLUTION: A first photosensitive resin contains (A) the vinyl copolymer of means molecular weight of 20000-300000 to be obtained through the vinyl copolymerizing at least one kind of a first monomer to be selected from α,β-unsaturated carbonic acid, at least one kind the second monomer to be selected from alkylacrylate, etc., and at least one kind of the third monomer to be selected from acrylonitrile, (B) urethane polymer having ethylene unsaturated connection at the end, (C) ethylene unsaturated addition polymerization monomer, and (D) the photochemical polymerization starting agent. A second photosensitive resin layer contains (E) vinyl copolymer of 20000-300000 in mean molecular weight to be obtained through vinyl copolymerization of at least one kind of fourth monomer to be selected from α,β-unsaturated carbonic acid, and at least one kind of fifth monomer to be selected from alkylacrylate, etc., (F) ethylene unsaturated addition polymerization monomer, and (G) the photochemical polymerization starting agent. |
