发明名称 |
Radiation sensitive resin composition |
摘要 |
<p>A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which is decomposed by the action of an acid and increases the solubility in an alkaline developing solution and a recurring unit(II) obtained from a compound having at least two (meth)acryloyl groups in the molecule by the cleavage of the carbon-carbon double bond, and (B) a photoacid generator which produces an acid on being irradiated by a radiation. The composition exhibits high resolution, superb capability of producing superior pattern forms, and excellent resistance to PED, and high process stability, is affected by a standing wave only to a minimum extent, and possessed prominent heat resistance.</p> |
申请公布号 |
EP0843220(A1) |
申请公布日期 |
1998.05.20 |
申请号 |
EP19970120011 |
申请日期 |
1997.11.14 |
申请人 |
JAPAN SYNTHETIC RUBBER CO., LTD. |
发明人 |
TANABE, TAKAYOSHI;KOBAYASHI, EIICHI;SHIMIZU, MAKOTO;IWANAGA, SHIN-ICHIRO |
分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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