发明名称 ON-LINE MONITORING SYSTEM FOR INSTRUMENTATION SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To directly monitor the setting values during normal operation by calculating prescribed setting values of respective modules from the frequency response of the respective modules measured by means of a frequency response measuring means. SOLUTION: The module 6 is not taken-out from a rack but sine wave is impressed on a process signal with an adder 5 instead and, then, the input/output of the module 6 at that time is measured by a measuring part 9. A frequency spectrum generating part 10 obtains a power spectrum by resolving respective frequencies for input/output data of the measured modules 6. A board diagram generating part 12 compares the power spectrums of respective inputs/outputs in the frequency of impressed sine wave so as to obtain the gain of the module 6 in the frequency and a phase. Then, while changing the frequency of impressed sine wave, this work is repeated so that the gain-frequency characteristics and the phase-frequency characteristic of the first delay module 6 are calculated.</p>
申请公布号 JPH10124133(A) 申请公布日期 1998.05.15
申请号 JP19960279590 申请日期 1996.10.22
申请人 MITSUBISHI HEAVY IND LTD 发明人 NAKAGAWA MASATO;DEGUCHI MASAYUKI;HORIMOTO TAKAHIRO
分类号 G21C17/00;G05B23/02;(IPC1-7):G05B23/02 主分类号 G21C17/00
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